000 02050nab a2200313 c 4500
001 vtls000581434
003 RU-ToGU
005 20210907025944.0
007 cr |
008 170905|2015 ne s a eng d
024 7 _a10.1016/j.jcrysgro.2015.07.005
_2doi
035 _ato000581434
040 _aRU-ToGU
_brus
_cRU-ToGU
100 1 _aFilimonov, Sergey N.
_989121
245 1 0 _aModel of step propagation and step bunching at the sidewalls of nanowires
_cS. N. Filimonov, Y. Y. Hervieu
504 _aБиблиогр.: 35 назв.
520 3 _aRadial growth of vertically aligned nanowires involves formation and propagation of monoatomic steps at atomically smooth nanowire sidewalls. Here we study the step dynamics with a step flow model taking into account the presence of a strong sink for adatoms at top of the nanowire and adatom exchange between the nanowire sidewall and surrounding substrate surface. Analytical expressions for velocities of steps propagating from the nanowire base to the nanowire top are obtained. It is shown that the step approaching the nanowire top will slow down if the top nanowire facet is a stronger sink for adatoms than the sidewall step. This might trigger bunching of the steps at the sidewall resulting in development of the pencil-like shape of nanowires such as observed in, e.g., the Au-assisted MBE growth of InAs.
653 _aнаноструктуры
653 _aповерхностные процессы
653 _aмолекулярно-лучевая эпитаксия
653 _aмодели роста
655 4 _aстатьи в журналах
_9681159
700 1 _aHervieu, Yurij Yurevich
_993226
773 0 _tJournal of crystal growth
_d2015
_gVol. 427. P. 60-66
_x0022-0248
852 4 _aRU-ToGU
856 7 _uhttp://vital.lib.tsu.ru/vital/access/manager/Repository/vtls:000581434
908 _aстатья
999 _c406801