Influence of surface modification of nitinol with silicon using plasma-immersion ion implantation on the alloy corrosion resistance in artificial physiological solutions O. A. Kashin, D. P. Borisov, A. I. Lotkov [et.al.]
Material type: ArticleSubject(s): нитинол | кремний | коррозионная стойкость | физиологические растворы | электрохимическое поведениеGenre/Form: статьи в журналах Online resources: Click here to access online In: AIP Conference Proceedings Vol. 1683. 020077-1-020077-6Abstract: Cyclic voltammetry and potentiostatic polarization have been applied to study electrochemical behavior and to determine corrosion resistance of nitinol, which surface was modified with silicon using plasma-immersion ion implantation, in 0.9% NaCl solution and in artificial blood plasma. It was found out that continuous, and also homogeneous in composition, thin Si-containing layers are resistant to corrosion damage at high positive potentials in artificial physiological solutions due to formation of stable passive films. Breakdown potential Eb of Si-modified NiTi depends on the character of silicon and Ni distribution at the alloy surface, Eb values amounted to 0.9–1.5 V (Ag/AgCl/KCl sat.) for the alloy samples with continuous Si-containing surface layers and with decreased Ni surface concentration.Библиогр.: 9 назв.
Cyclic voltammetry and potentiostatic polarization have been applied to study electrochemical behavior and to determine corrosion resistance of nitinol, which surface was modified with silicon using plasma-immersion ion implantation, in 0.9% NaCl solution and in artificial blood plasma. It was found out that continuous, and also homogeneous in composition, thin Si-containing layers are resistant to corrosion damage at high positive potentials in artificial physiological solutions due to formation of stable passive films. Breakdown potential Eb of Si-modified NiTi depends on the character of silicon and Ni distribution at the alloy surface, Eb values amounted to 0.9–1.5 V (Ag/AgCl/KCl sat.) for the alloy samples with continuous Si-containing surface layers and with decreased Ni surface concentration.
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